Fine Machine Finishing Polishing Pad ( 2 Stuks )
The best machine polishing pad for creating a flawless, glossy finish, our Professional Series No.15 Fine Finishing Pad is ideal for the final stage of paint refinement prior to the application of protection layers, such as waxes, paint sealants or ceramic coatings.
Developed alongside our Professional Series Compounds, and specifically designed to complement their use over multiple paint correction stages, our range of Professional Series Machine Polishing Pads are the culmination of over 3-years of testing and development, both in-house and by over 25 professional detailers around the world.
Each pad is constructed from premium open cell foam which is designed to work abrasive compounds through quickly and effectively, while actively collecting and locking away spent compound residues to stop them interfering with achieving the best possible finish. This advanced foam material offers the highest tensile strength and increased elasticity for extreme durability, making our Professional Series Machine Polishing Pads tough enough to stand up to repeated professional use time and time again. Our professional quality pads also benefit from a strong hook and loop fastener backing to suit all professional machine polishers fitted with a 5-inch backing plate.
Fine paint refinement using a light abrasive machine polishing pad and a fine finishing compound is a process designed to level down the top layer of paint or clear clear-coat to level the optical finish. By achieving a completely smooth, level surface light is allowed to bounce back to the eye more uniformly, giving the appearance of a deeper, glossier surface. Our Professional Series Fine Finishing Pad is made from a light abrasive foam designed to complement your refining compound, allowing this process to be completed quickly, safely and more effectively. When paired with our Professional Series No.15 Fine Finishing Compound, our No.15 Fine Finishing Pad offers the ultimate detailers combo for impeccable finishing.